Advanced Optical System Design using OpticStudio

This course teaches advanced topics in optical system design using OpticStudio's sequential design environment. Attendees will learn the key features and functions to take an imaging design from initial specification to manufacture and testing.                       

Topics include:
  • Global and local optimization
  • Thermal analysis
  • Polarization and thin film coatings
  • Diffraction
  • Designing with freeforms & aspheres
  • Tolerancing 3D systems
  • Simulating lasers

All courses have a minimum attendance requirement.  If the course cannot meet the minimum attendance, students will be notified of the course cancellation no later than 2 weeks prior to the event.

Prerequisites: 

A background in optics and experience with OpticStudio or attendance of Optical System Design Using OpticStudio.

Duration: 5 days

Schedule:

September 11 - 15, 2017 Washington DC
September 18 - 22, 2017 United Kingdom
December 4 - 8, 2017 United Kingdom




Register 

*Registration for training courses ends one week prior to the course


start date.