Illumination & Stray Light


This course introduces attendees to the OpticStudio non-sequential design environment for modeling illumination systems. Attendees learn how to model, analyze, optimize, and tolerance non-sequential systems. Other topics in addition to those listed below include radiometry and photometry, colorimetry, BSDF, bulk scattering, photoluminescence, and using the Zemax Part Designer.
Topics
  • Day 1: Introduction to non-sequential systems, sources, and analysis methods
  • Day 2: Optimization, tolerancing, complex geometries, and CAD parts
  • Day 3: Using mixed sequential/non-sequential mode, ray splitting, and troubleshooting techniques
  • Day 4: Stray light analysis, scattering, and switching between sequential and non-sequential mode

Skills Gained
  • Model, analyze, optimize, and tolerance illumination, imaging, and collimation systems in non-sequential mode
  • Build mixed sequential and non-sequential systems, like prisms, fibers, or other systems that generate total internal reflection (TIR)
  • Conduct stray light analysis of an imaging system

Prerequisites
Familiarity with illumination or imaging systems is encouraged. No prior knowledge of OpticStudio is required.  
Duration
4 days

Schedule:

October 2 - 5, 2017 Seattle
October 23 - 26, 2017 United Kingdom



 

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*Registration for training courses ends one week prior to the course start date

All courses have a minimum attendance requirement. If the course cannot meet the minimum attendance, students will be notified of the course cancellation no later than 2 weeks prior to the event.