Optical System Design in OpticStudio

This course provides a solid introduction to the OpticStudio sequential design environment, and this is intended for those with a background in optics. Attendees will acquire the skills to design, optimize and tolerance imaging systems through hands-on examples and exercises that simulate actual design challenges.

Topics include:

  • Glass and refractive index
  • First and third-order optics
  • Aberration descriptions
  • Optimization
  • Image simulation
  • Diffraction and MTF
  • Three-dimensional optical systems
  • Local and global coordinate systems
  • Tilts, decenters, folds and scanning mirrors
  • Tolerancing for manufacturing

All courses have a minimum attendance requirement.  If the course cannot meet the minimum attendance, students will be notified of the course cancellation no later than 2 weeks prior to the event.                                                                          

A background in Optics is required for this course. For those form different engineering disciplines, we strongly encourage attending Fundamentals of Optics prior to attending this course. No prior knowledge of OpticStudio is required.

Duration: 5 days


August 21 - 25, 2017 United Kingdom
August 28 - September 1, 2017 Seattle
October 30 - November 3, 2017 San Francisco
November 13 - 17, 2017 United Kingdom


*Registration for training courses ends one week prior to the course start date.

Courses taught in France are not available for online purchase. Contact eusales@zemax.com to sign up.

We now offer an online version of this course. Click here to learn more!